Page 32 - Univac Catalog_E_Book
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AR/AF SPUTTERING SYSTEM                                                                                                                                         Description                  Speci cation



                                                                                                                                                                                                             -  Vertical type
                                                                                                                                                                                Process Chamber  Process chamber  -  Material : STS304
                                                                                                                                                                                                             -  Size : Ø1650mm x 1840mm
                                                                                                                                                                                Substrate rotation   Rotation  -  Rotational type : Revolution and
                                                                                                                                                                                & carrier                     rotation
                                                                                                                                                                                                 HV Pump     -  Turbo pump
                                                                                                                                                                                Exhausting system
                                                                                                                                                                                                 LV Pump     -  Dry pump
                                                                                                                                                                                                Pirani gauge  - Low Vac Range :760torr ~ 3×E-4torr
                                                                                                                                                                                 Vacuum gauge
                                                                                                                                                                                                 Ion gauge   - High Vac Range :8×E-3 ~ 3×E-9torr
                                                                                                                                                                                 Cooling system  Polycold    -  Cold chiller
                                                                                                                                                                                 Heating system              -  Outgasing purpose
                                                                                                                                                                                 Processing gas   M.F.C      -  MFC(N2,O2 100sccm)
                                                                                                                                                                                   Control                   -  APC : needle valve
                                                                                                                                                                                                             -  Dual cylindrical target
                                                                                                                                                                                    Source    Cylinderical Target
                                                                                                                                                                                                             -  Thickness: 10mmT
                                                                                                                                                                                                             -  Power : up to 100kw DC or 80kw MF/AC
                                                                                                                                                                                                 End Block
                                                                                                                                                                                                              V/A : 1000V/225A
                                                                                                                                                                                 Sputter source
                                                                                                                                                                                                  Magnet     -  70%↑ target Utilization, ±5% Uniformity
                                                                                                                                                                       EnerPulse  10
                                                                                                                                                                                                             -  100mm(W) × 1,400mm(H)
                                                                                                                                                                                  Ion Source     Linear type
                                                                                                                                                                                                             -  10kw, Ar,O2 /500sccm
          BENEFITS                                                                                                                                                               Thermal source  Center pole  -  30kw
                                                                                                                                                                                                Electric power  - 3ph 220V/440V 60Hz
                                                                                                                                                                                 Electric /Control
         - AR/AF coating by sputtering                         Description                   Speci cation                                                                                         Control    - PC(HMI)+PLC(I/O) Programming
           Substrate cleaning by LIS                                                -  Vertical type
         - High density / Uniformity                 Process Chamber  Process chamber  -  Material : STS304
           High deposition rate                                                     -  Size : Ø1650mm x 1840mm
           Process stability                         Substrate rotation   Rotation  -  Rotational type : Revolution and
           Easy replacement target                   & carrier                       rotation
                                                                       HV Pump      -  Turbo pump
                                                     Exhausting system
                                                                       LV Pump      -  Dry pump
                                                                      Pirani gauge  - Low Vac Range :760torr ~ 3×E-4torr
                                                      Vacuum gauge                                                                                                                E             D
                                                                       Ion gauge    - High Vac Range :8×E-3 ~ 3×E-9torr           A  Processing Chamber
                                                      Cooling system   Polycold     -  Cold chiller
                                                                                                                                  B  System Controller
                                                      Heating system                -  Outgasing purpose
                                                      Processing gas    M.F.C       -  MFC(N2,O2 100sccm)                         C  High vacuum pump
                                                        Control                     -  APC : needle valve
                                                                                                                                     (Oil diffusion / Cryo/ Turbo pump)                                                     B
                                                                                    -  Dual cylindrical target                                                                                      C
                                                         Source     Cylinderical Target                                           D  Low vacuum pump
                                                                                    -  Thickness: 10mmT
                                                                                                                                     (Rotary pump+Booster)
                                                                                    -  Power : up to 100kw DC or 80kw MF/AC
                                                                       End Block
                                                                                      V/A : 1000V/225A                            E  Water vapor cryocooler                                         A
                                                      Sputter source
                  Plasma                                                Magnet      -  70%↑ target Utilization, ±5% Uniformity
                        Ti
                                                       Ion Source      Linear type  -  100mm(W) × 1,400mm(H)
                         Ti                                                         -  10kw, Ar,O2 /500sccm
                                                      Thermal source   Center pole  -  30kw
                                                                      Electric power  - 3ph 220V/440V 60Hz
                                                      Electric /Control
                                                                        Control     - PC(HMI)+PLC(I/O) Programming


               Chamber wall
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