Page 22 - Univac Catalog_E_Book

IBAD UNIVAC

SYSTEM SERIES 2050

高真空多层膜镀膜机
System Model UNIVAC-2050
Process Chamber Ø2050×H1750

28”×2set
3
Pumping Mechanical booster Pump 2,600m h-1 ×1set
System Oil Rotary Pump 300m h-1 ×1set
3
Meissner Trap Polycold

Substrate Carrier Calotte Diameter 2,000mm
Substrate Heating Halogen Heater Up to 250℃
Electron Beam Source 10kw
Evaporation Source
Thermal Source 5kw
Substrate Treatment Ion Source 4kw
Thin Film Thickness Quartz Crystal Thickness Monitoring QCM
Monitoring Optical Thickness OMS
Monitoring(optional)
Power 3ph 380/220V
Frequency AC 50/60Hz
Power 90kw(Max)
Utility
Water Pressure 2 ~ 4kgf/ ㎠
Air Pressure 5 ~ 6kgf/ ㎠
Floor Load Weight 1,100kg(approx)

D
F
A Processing Chamber
G
C
B System Controller
E
C Electron beam power supply

D Ion beam power supply
B
E High vacuum pump
(Oil diffusion / Cryo/ Turbo pump) A
F Low vacuum pump
(Rotary pump+Booster)
G Water vapor cryocooler

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