Page 19 - Univac Catalog_E_Book

IBAD UNIVAC

SYSTEM SERIES 1500

高真空多层膜镀膜机
System Model UNIVAC-1500

Process Chamber Ø1500×H1500
28”×2set
Pumping Mechanical booster Pump
System Oil Rotary Pump

Meissner Trap Polycold
Substrate Carrier Calotte Diameter 1,450mm
Substrate Heating Halogen Heater Up to 250℃
Electron Beam Source 10kw
Evaporation Source
Thermal Source 5kw
Substrate Treatment Ion Source 4kw

Thin Film Thickness Quartz Crystal Thickness Monitoring QCM
Monitoring Optical Thickness OMS
Monitoring(optional)
Power 3ph 380/220V
Frequency AC 50/60Hz
Power 90kw(Max)
Utility
Water Pressure 2 ~ 4kgf/ ㎠
Air Pressure 5 ~ 6kgf/ ㎠
Floor Load Weight 5,000kg(approx)

F
A Processing Chamber
G C D
B System Controller

C Electron beam power supply
E
D Ion beam power supply
B
E High vacuum pump
(Oil diffusion / Cryo/ Turbo pump) A
F Low vacuum pump
(Rotary pump+Booster)

G Water vapor cryocooler

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