Page 14 - Univac Catalog_E_Book

IBAD UNIVAC

SYSTEM SERIES 1200

高真空多层膜镀膜机
System Model UNIVAC-1200
Process Chamber Ø1200×H1080

22”×2set
Mechanical booster Pump
Pumping or cryopump
System Oil Rotary Pump
Meissner Trap Polycold

Substrate Carrier Calotte Diameter 1,150mm
Substrate Heating Halogen Heater Up to 250℃
Electron Beam Source 10kw
Evaporation Source
Thermal Source 5kw
Substrate Treatment Ion Source 4kw
Thin Film Thickness Quartz Crystal Thickness Monitoring QCM
Monitoring Optical Thickness OMS
Monitoring(optional)
Power 3ph 380/220V

Frequency AC 50/60Hz
Power 90kw(Max)
Utility
Water Pressure 2 ~ 4kgf/ ㎠

Air Pressure 5 ~ 6kgf/ ㎠
Floor Load Weight 4,000kg(approx)

A Processing Chamber F C D
B System Controller

C Electron beam power supply G

D Ion beam power supply E B

E High vacuum pump
(Oil diffusion / Cryo/ Turbo pump)
F Low vacuum pump A
(Rotary pump+Booster)

G Water vapor cryocooler

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