Page 12 - Univac Catalog_E_Book

IBAD UNIVAC

SYSTEM SERIES 1050

高真空多层膜镀膜机 System Model UNIVAC-1050
Process Chamber Ø1050×H1280
Di usion Pump 22”×2set

Pumping Mechanical booster Pump 1,200m³h-1
System Oil Rotary Pump 300m³h-1

Meissner Trap Polycold

Substrate Carrier Calotte Diameter 1,000mm
Substrate Heating Halogen Heater Up to 250 ℃
Electron Beam Source 10kw
Evaporation Source
Thermal Source 5kw
Substrate Treatment Ion Source 4kw
Quartz Crystal Thickness
Thin Film Thickness Monitoring QCM
Monitoring Optical Thickness
Monitoring(optional) OMS
Power 3ph 380/220V
Frequency AC 50/60Hz

Power 90kw(Max)
Utility
Water Pressure 2 ~ 4kgf/ ㎠
Air Pressure 5 ~ 6kgf/ ㎠

Floor Load Weight 3,500kg(approx)

A Processing Chamber F
C D
B System Controller

C Electron beam power supply G

D Ion beam power supply
E
E High vacuum pump B
(Oil diffusion / Cryo/ Turbo pump)
F Low vacuum pump
(Rotary pump+Booster)
A
G Water vapor cryocooler

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