Page 11 - Univac Catalog_E_Book
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IBAD UNIVAC
SYSTEM SERIES 900
高真空多层膜镀膜机 System Model UNIVAC-900
Process Chamber Ø900×H1080
22”×1set
Pumping Mechanical booster Pump
System Oil Rotary Pump
Meissner Trap Polycold
Substrate Carrier Calotte Diameter 850mm
Substrate Heating Halogen Heater Up to 250℃
Electron Beam Source 10kw
Evaporation Source
Thermal Source 5kw
Substrate Treatment Ion Source 4kw
Thin Film Thickness Quartz Crystal Thickness Monitoring QCM
Monitoring Optical Thickness
Monitoring (optional) OMS
Power 3ph 380/220V
Frequency AC 50/60Hz
Power 80kw(Max)
Utility
Water Pressure 2 ~ 4kgf/ ㎠
Air Pressure 5 ~ 6kgf/ ㎠
Floor Load Weight 3,000kg(approx)
A Processing Chamber
B System Controller F C D
C Electron beam power supply
D Ion beam power supply G
E
E High vacuum pump B
(Oil diffusion / Cryo/ Turbo pump)
F Low vacuum pump A
(Rotary pump+Booster)
G Water vapor cryocooler
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