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ELECTRON BEAM SOURCE THIN FILM DEPOSITION CONTROL
Univac electron beam gun applies an electron beam vertically onto the evaporant surface by electric and magnetic field. The gun provides uniform
energy distribution, making it ideally suited for deposition of oxides as well as sublimation material. And this gun holds multiple crucibles, it is Thin Film Deposition Controllers
used as a general purpose electron beam gun for producing optical multi-layer films.
Physical thickness monitors
Features Specifications
IC-6
Directly heats evaporation materials, thus assuring you of high 3-phase 220V(±10%)
thermal efficiency and enabling high-melting-point metals such as Input power 60Hz The IC/6 Thin Film Deposition Controller maximizes process capability and flexibility for evaporation and
W, Ta, and Mo and oxides to be evaporated. other physical vapor deposition (PVD) processes.
Sine wave Enhanced software and logic I/O features provide improved process control integration.
Employs a water-cooled copper crucible which, unlike resistance Accelerating Voltage: 4kV ~10kV
heating, does not cause evaporation material to react with the Output Emission current: 0~ 1.0A
heater, thus allowing high-purity optical thin films to be produced.
Maximum output: 10kW
Uses a tungsten filament as the electron-beam source. Its running Deflection 180 XTC/3
costs are very low compared to resistance heating. X-SCAN :50Hz The XTC/3 is a closed loop process controller designed for use primarily in physical vapor deposition. The
Y-SCAN :50Hz XTC/3 monitors controls the rate and thickness of thin film depositions. This technique positions sensors in
Scan Controller : 1EA the path between, or to the side of, the target substrate and the source of vaporized material.
Frequency
EBG power supply: 1EA
Gun (180˚)
E1, E2 Cable : 1EA
SQC-310
HV Cable : 2EA
Component Cable SQC-310 series instruments are multi-channel QCM-based deposition controllers. They provide a unique
Sweep Cable : 1EA
combination of accuracy and powerful features in a compact, low cost instrument. The standard SQC-310
Ground wire
measures up to two quartz crystal sensors, and controls up to two evaporation sources. Eight process control
relays, and eight digital inputs are included to support a broad range of external devices.
Optical thickness monitors
Various Electron Beam Module and Crucibles (6, 8, 12, 24 pockets)
OMD-1000
OMD-1000 has been developed to monitor the film thickness on the substrate in the coating process.
Chopped light reflects on the thin film and then the change of reflection is observed. It enables to control
each layer precisely and to produce excellent optical components.
IL541 / 550 / 850
The IL550 Series of optical monitors are designed to be fitted to your coating chamber and integrated into
your coating process. And it provide real-time endpoint capability for a wide range of precision optical
coating applications ranging from 300nm to beyond 12 microns.
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