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VACUUM PUMP                                                                                                     ION BEAM SOURCE                                        ( End-Hall type )







             Low Vacuum                                                                                                               Ion Beam Source (End-Hall type)



                                       Rotary vane pump                                                                                                             Ion Assisted Deposition (IAD) has become well established as a means of improving optical performance,
                                                                                                                                                                    such as durability, stability with humidity and temperature, and better stoichiometry and reducing cost
                                       The BOC Edwards EM range of direct drive Rotary Vane Pumps are inherently compact and vibration free                         and defects.
                                       with their finger-proof fan and coupling housings and totally enclosed fan-cooled motors, they offer
                                       excellent operator protection.                                                                                               Univac DC Ion Beam Source (End-hall type) can be operated during the deposition process to provide
                                       Add our extensive range of accessories, and the pumps can be configured for a wide range of                                  beneficial effects in thin film nucleation and packing density.
                                       applications. The pumps and accessories can be supplied either as individual components or as fully
                                       systemized, factory-tested combinations.


                                       Mechanical booster pump                                                                        Benefits                                          Specifications

                                       The Edwards EH mechanical booster pumps feature a unique hydrokinetic dive which provides efficient   Increased film adhesion and density.
                                       power transmission with benefits in economy, performance and compactness. These booster pumps   Control of film stoichiometry.                         Anode Voltage                 0 ~ 300V
                                       are suitable for use with high differential pressures which allow the booster pump to be started at the   Higher index of refraction.                    Ion energy                   200eV
                                       same time as the backing pump, reducing total pump down times.                                 Low film absorption and scatter.                    Ion wdistribution angle            60˚
                                                                                                                                      Smooth film interfaces.
                                                                                                                                      Hard film abrasion resistant films.                   Filament diameter              0.375, 0.6mm
                                                                                                                                      Control of film stress.                                Filament current                0 ~ 30A
                                                                                                                                      Substrate surface activation.
                                                                                                                                      Low temperature processing                             Filament material              Tungsten
                                                                                                                                                                                         Anode cooling water flow        Not less than 2ℓ/min

                                                                                                                                                                                              Anode current                  0 ~ 9A
                                                                                                                                                                     Power supply
                                                                                                                                                                                          Recommended gas flow             10 ~ 30sccm
                                                                                                                                                                                                Dimension               139mm(D)*264mm(H)

                                                                                                                                                                                               Input voltage                 AC220V
                                                                                                                                                                Ion Beam Source Controller
                                                         Combination of low vacuum pumps to
                                                            improve pumping capability

                                                                                                                                      Characteristic graph for Ion Beam Source


















                                                                                                                                                                                                                               Operation Image of
                                                                                                                                                                                                                                Ion Beam Source


                           Equipped Oil diffusion Pump                        Equipped Cryogenic Pump

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