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VACUUM PUMP                           ION BEAM SOURCE                                        ( End-Hall type )







 Low Vacuum    Ion Beam Source (End-Hall type)



 Rotary vane pump                            Ion Assisted Deposition (IAD) has become well established as a means of improving optical performance,
                                             such as durability, stability with humidity and temperature, and better stoichiometry and reducing cost
 The BOC Edwards EM range of direct drive Rotary Vane Pumps are inherently compact and vibration free   and defects.
 with their finger-proof fan and coupling housings and totally enclosed fan-cooled motors, they offer
 excellent operator protection.              Univac DC Ion Beam Source (End-hall type) can be operated during the deposition process to provide
 Add our extensive range of accessories, and the pumps can be configured for a wide range of   beneficial effects in thin film nucleation and packing density.
 applications. The pumps and accessories can be supplied either as individual components or as fully
 systemized, factory-tested combinations.


 Mechanical booster pump  Benefits                               Specifications

 The Edwards EH mechanical booster pumps feature a unique hydrokinetic dive which provides efficient   Increased film adhesion and density.
 power transmission with benefits in economy, performance and compactness. These booster pumps   Control of film stoichiometry.  Anode Voltage  0 ~ 300V
 are suitable for use with high differential pressures which allow the booster pump to be started at the   Higher index of refraction.  Ion energy  200eV
 same time as the backing pump, reducing total pump down times.  Low film absorption and scatter.  Ion wdistribution angle  60˚
               Smooth film interfaces.
               Hard film abrasion resistant films.                   Filament diameter              0.375, 0.6mm
               Control of film stress.                                Filament current               0 ~ 30A
               Substrate surface activation.
               Low temperature processing                             Filament material              Tungsten
                                                                  Anode cooling water flow        Not less than 2ℓ/min

                                                                       Anode current                  0 ~ 9A
                                              Power supply
                                                                   Recommended gas flow             10 ~ 30sccm
                                                                         Dimension               139mm(D)*264mm(H)

                                                                        Input voltage                 AC220V
                                         Ion Beam Source Controller
 Combination of low vacuum pumps to
 improve pumping capability

               Characteristic graph for Ion Beam Source


















                                                                                                        Operation Image of
                                                                                                         Ion Beam Source


 Equipped Oil diffusion Pump  Equipped Cryogenic Pump

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