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We provide Metal Coating Systems through QCM machine.
QCM measures a mass variation per unit area by measuring the change in frequency of a quartz crystal resonator.
QCM is useful for monitoring the rate of deposition in thin film deposition systems under vacuum.
- Dual E-Beam source
- RF Ion source
- Thickness monitor
Optical Process Monitoring
QCM (Quartz Crystal Microbalance)
Item | Specification | |
---|---|---|
Ultimate Pressure | ≤ 5.0×10-5 Pa | |
Leak Rate | ≤ 2.0×10-3 Pa | |
Build up | ≤ 7.0×10-6 Pa・m3/s | |
Pumping speed | 27,000L/sec | |
Heat performance | Uniformity | 250±10℃ |
Heating Temp. Range | 25~350℃ | |
Temp. Rising Time | ≤ 30min (250±10℃) | |
Deposition Performance | Single layer film Tickness Uniformity | Within ±1.0% at optical film thickness 3/4λ(λ=650nm |
General Deposition performance |
*# of layers:40 Layers *Characteristic:IA=5° Rave > 98% @ 420nm~700nm IA=5° R < 10% @1064nm |
|
Reflectance | 420~700nm : > 98% |
Description | Specification | |
---|---|---|
Process Chamber | Process chamber |
Vertical type Material : STS304 Size 1 : Ø2050mm(D) × 1650mm(H) Size 2 : Ø1350mm(D) × 1400mm(H) Heating : Micro sheathe heater |
Substrate rotation & carrier | Rotation | Rotational type : Revolution and rotation |
Exhausting system | HV Pump | Oil diffusion or Cryo Pump |
LV Pump |
Rotary vane pump Booster pump |
|
Evaporation source | E/B Gun #1 | SiO2 only |
E/B Gun #2 |
No. of crucible : 20 Quantity of crucible : 25cc |
|
RF Ion beam source | Ion beam | Size : 170mm, 230mm |
Power supply |
RF2002, 1200Watt 50 ~ 1200V, 1200mA |
|
Thickness monitor | QCM | |
OPM |
Wavelength 350 ~ 1100nm Glass changer 80 point |
|
Processing gas suppl | M.F.C | 100sccm~500sccm |
Vacuum gauge | Cold cathode gauge & Pirani gauge | |
Auto pressure control |
Gas flow 5 × E-6 mbar l/s, (Max.), 1,250mbar l/s(Min.) |
|
System controller | PC(HMI) + PLC(I/O)+Thickness monitor |
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