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Sputtering System

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“SPUTTERING” is a vacuum process used to deposit very thin films on substrates.
We provide Sputtering Coating Systems.
The models are classified according to the functions and specifications of the product.

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Magnetron Sputtering System

Magnetron Sputtering System image 01

Reducing of pumping time by using effective Univac’s oil diffusion pump. Excellent uniformity & maximum production yields. Easy operation & maintenance. PC-based effective automatic system control for coating process. Increased film adhesion. Low temperature coating process available. Various color deposition according to used material.


Dimension : Φ1400×H1630, Φ1550×H1630 Magnetron sputtering target (3ea). DC pulse power supply for sputtering (20kW, 30kHz). Linear type ion source. DC power supply for ion source (5kW, normal). Low vacuum pump (Rotary & Booster pump). Vacuum gauge (2 Low & 1 High range). Deposition control by XTC according to deposition time. Gas flow by MFC (2 Ar, 2 O2 each). Heating system by micro heater. PC-based system controller. Cooling system (Polycold).High vacuum pump (Oil diffusion pump, 22”×2ea /option : Turbo molecular pump).

SPUTTERING” is a vacuum process used to deposit very thin films on substrates for a wide variety of commercial and scientific purposes.
It is performed by applying a high voltage across a low-pressure gas (usually argon at about 5 millitorr) to create a “plasma,“ which consists of electrons and gas ions in a highenergy state. During sputtering, energized plasma ions strike a “target”, composed of the desired coating material, and cause atoms from that target to be Ejected with enough energy to travel to, and bond with, the substrate.

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USP 450

USP 45 image

The Univac sputtering deposition system, USP 450 incorporates 6 cylindrical targets in side wall for increasing deposition rate and multi-layer coating.
This system is provided with DC pulse or RF power round cylindrical cathodes. Vertically mounted substrates and cylindrical cathodes minimize particulate contamination during coating process.

  • Inside view of UPS 450 image Inside view of UPS 450
  • Cylindrical target image Cylindrical target
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  • Image of plasma generation image Image of plasma
  • Cylindrical target image Cylindrical target
USP 450 information
System Model UPS 450
Chamber Chamber 516 x 628 x 914 H
Target room 370 x 170 x 914 H
Outlet room 516 x 526 x 360 H
Pumping System Oil Diffusion Pump 22" 1 set or TMP
Mechanical Booster Pump 1,200 m³/h
Oil Rotary Pump 3,000 l/min
Substrate Heater Max. 250 ℃ (substrate)
Power DC+RF, 10kW, 2set
Vacuum Gauge Controller High Vacuum Ion Gauge or Active
Low Vacuum Convection or Pirani
Deposition Controller Crystal Monitoring System
Optical Monitoring System
Target Cylindrical type 1 part 2ea, total 6ea
Cooling System 20RT

As Korea vacuum coating system offers, UNIVAC is optical coating technology LTD

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